The NanoFab facility at the University of Ottawa provides users with open access to cutting-edge tools within the research facility, specializing in nanofabrication and characterization. Our facilities are open to both academic and industrial researchers, which makes the NanoFab ideal for prototype development and fabrication.
**THE NANOFAB FACILITY IS BEING RENOVATED**
There are some exciting changes coming to the uOttawa NanoFab which means there are going to be disruptions in the facility until the middle of September 2026 (approximately). ARC 305 will be added to the NanoFab and will be set up as a Metrology Lab (gowning will not be necessary). Completion of this lab is scheduled for the end of October 2025. A new clean room will be added (333D) and the yellow room will be expanded (333A) with completion scheduled by the end May 2026. 333B and C will remain untouched. ARC 329 will become a dirty lab with sink and fume hood for electroplating, general chemical work and back-end processing with completion scheduled by the end of May 2026.
We will also be adding new tools: a Elionix Boden 100 kV e-beam lithography system, a Veeco Fiji atomic layer deposition system, a KLOE Dilase 650 direct-write (maskless) laser lithography system, a Class 100 fume hood for lithography, a new Laurell spin coating system, an Oxford Plasma Pro 80 RIE system, a critical point dryer, a tube furnace, a sputtering system (dual RF / dual DC sources), a small-chamber evaporator, a goniometer, and a Centrifuge.
We appreciate your patience and understanding as this renovation moves forward. If you have any questions, please do not hesitate to contact Betty (
[email protected]), Spyros (
[email protected]) or Prof Pierre Berini (
[email protected])