Etching System - SAMCO RIE-110ip


The SAMCO RIE-110iP is an inductively coupled plasma etcher that provides both fluorine- and chlorine-based etch chemistries for anisotropic etching of semiconductor wafers.

It is primarily used for patterning silicon and III-V wafers for nanophotonic structures.

Download the SAMCO RIE-110iP Etching System Brochure (PDF version, 274 KB)

Image of the SAMCO RIE-110iP etching system