Rapid Thermal Annealing System – Solaris 100


The Surface Science Integration (SSI) Solaris 100 is a manual loading RTA system for research and development and pre-production:

  • Wafer capability: 1″ to 4″
  • Operating Temperature Range: room temperature to 1250°C
  • Option of top side or bottom side heating to reduce non-uniform heating
  • 9 different graphing options
  • Excellent repeatability
Image of the Rapid Thermal Annealing System