The Raith PIONEER is an electron beam lithography (EBL) system integrated with a scanning electron microscope (SEM). This allows users to analyze the structural composition of their nanostructures.

This unit includes a laser interferometer translation stage. It also possesses two electron detectors: in-line and scattering. The maximum acceleration voltage for this system is 30 kV. Priority is given to users looking to use the tool for lithography purposes. 

Scanning Electron Microscope (SEM)

  • Rating: Difficulty: 5/10, (1 being easy, 10 being very difficult)
  • Training time required: 5-15 hours
  • Prerequisites:
    • Hands-on lab experience
    • Gemini500 SEM
    • Good hand-eye coordination
    • General knowledge of how a focused electron beam interacts with materials

Electron Beam Lithography (EBL)

  • Rating: Difficulty 8/10, (1 being easy, 10 being very difficult)
  • Training time required: 20+ hours
  • Prerequisites:
    • Gemini500 SEM
    • Spin processor
    • CAD layouts
    • Coordinate transformation systems
    • Electron beam physics (proximity effects, electron optics, etc.)
    • Organic polymers

Download the Raith PIONEER Brochure (PDF version, 2,283 KB)

Image of the Raith Pioneer SEM + EBeam tool