SEM + EBL – Raith PIONEER

The Raith PIONEER is an electron beam lithography (EBL) system integrated with a scanning electron microscope (SEM). This allows users to analyze the structural composition of their nanostructures.

This unit includes a laser interferometer translation stage. It also possesses two electron detectors: in-line and scattering. The maximum acceleration voltage for this system is 30 kV. Priority is given to users looking to use the tool for lithography purposes. 

Scanning Electron Microscope (SEM)

• Rating: Difficulty: 5/10, (1 being easy, 10 being very difficult)
• Training time required: 5-15 hours
• Prerequisites:
  • Hands-on lab experience
  • Gemini500 SEM
  • Good hand-eye coordination
  • General knowledge of how a focused electron beam interacts with materials

Electron Beam Lithography (EBL)

• Rating: Difficulty 8/10, (1 being easy, 10 being very difficult)
• Training time required: 20+ hours
• Prerequisites:
  • Gemini500 SEM
  • Spin processor
  • CAD layouts
  • Coordinate transformation systems
  • Electron beam physics (proximity effects, electron optics, etc.)
  • Organic polymers

Download the Raith PIONEER Brochure (PDF version, 2,283 KB)